Ti3SiC2-SiC multilayer thin films deposited by high temperature reactive chemical vapor deposition

Ti3SiC2-SiC multilayer film coatings synthesis was investigated with the high temperature reactive chemical vapor deposition technique. The method consists of a reaction between SiC (as substrate and interlayers) H2-TiClx gaseous mixture. Cross-section morphologies phases were studies by scanning electron microscopy (SEM), X-ray diffraction (XRD) automated crystal orientation mapping in transmission (ACOM-TEM). Thermodynamic calculations carried out to select more appropriate gas composition for reactor conditions understand chemistries layers different steps. Nano Vickers micro-indentation mechanical tests determined hardness elastic modulus Ti3SiC2 Ti5Si3Cx surfaces samples. Oxidation emissivity measurements allowed evaluation as materials applications. multilayered systems kept their integrity showed low degradation after 25 h thermal cycles at 900 °C air. measurement optical properties also revealed an increase absorptivity oxidation surface sample.